Рост анодных пленок на меди и особенности адсорбции на них 5-трифторметил-3-амино-1,2,4-триазола
https://doi.org/10.61852/2949-3412-2024-2-2-95-107
Аннотация
Изучено адсорбционное и пассивирующее действие 3-амино-1,2,4-триазола (3-АТ) и 5-CF3-3-амино-1,2,4-триазола (ТФАТ) на меди в нейтральном боратном буферном растворе. Оба соединения хемосорбируются на окисленной поверхности меди при потенциале E=0,0 В (н.в.э.) с величинами свободных энергий адсорбции 57,7 и 96,6 кДж/моль для 3-АТ и ТФАТ, соответственно. Эллипсометрическим методом подтвердили образование комплекса Cu(I)-ТФАТ, обнаруженного ранее методами рентгенофотоэлектронной и Оже-спектроскопии. Толщина комплекса Cu(I)-ТФАТ за 220 мин окисления при E=0,35 В достигает ≈4 нм.
Ключевые слова
Об авторах
М. О. АгафонкинаРоссия
Ленинский просп.31, корп. 4, Москва, 119071
Н. П. Андреева
Россия
Ленинский просп.31, корп. 4, Москва, 119071
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Рецензия
Для цитирования:
Агафонкина М.О., Андреева Н.П. Рост анодных пленок на меди и особенности адсорбции на них 5-трифторметил-3-амино-1,2,4-триазола. Коррозия: защита материалов и методы исследований. 2024;(2):95-107. https://doi.org/10.61852/2949-3412-2024-2-2-95-107
For citation:
Agafonkina M.O., Andreeva N.P. Growth of anode films on copper and features of adsorption of 5-triflouromethyl-3-amino-1,2,4-triazole on them. Title in english. 2024;(2):95-107. (In Russ.) https://doi.org/10.61852/2949-3412-2024-2-2-95-107